WebPhysical Electronics (PHI) is a subsidiary of ULVAC-PHI, the world's leading supplier of UHV surface analysis instrumentation used for research and development of advanced materials in a number of high technology fields including: nanotechnology, microelectronics, storage media, bio-medical, and basic materials such as metals, polymers, and … WebThe embedded ions are effectively removed from the vacuum chamber, resulting in a net pumping action. Ion pumps are commonly used in ultra-high vacuum and can attain pressures less than x 10-11. Ion Pumps have …
Equipment and Techniques - Steven M. George Research Group
http://nnci.oregonstate.edu/phi-5600 WebHome PHI 5600 XPS Three different X-ray sources including Mg K α (hν = 1253.6 eV), Al K α (hν = 1486.6 eV), and monochromatic Al K α (hν = 1486.4 eV). OmniFocus III small area lens. Typical XPS analysis area ~0.8 mm 2. Sputter depth profiles using Ar ion gun. Typical sample size ~20 x 20 mm 2 and 1 mm thick. In-situ sample heating up to 1073 K chicago style website citing
Ion Pumps Altair USA
WebAll Gamma Vacuum ion pumps are designed to operate for 45,000 – 50,000 hours at 1x10-6 mbar. Lifetime increases linearly with decreased pressure. At 1x10-9, for example, an ion pump can last for many years. ultimate pressure Ion pumps are capable of reaching pressures below 1x10-10 mbar. Ultimate pressure of an ion pump is dictated by overall ... WebPHI 5600 XPS Three different X-ray sources including Mg K α (hν = 1253.6 eV), Al K α (hν = 1486.6 eV), and monochromatic Al K α (hν = 1486.4 eV). OmniFocus III small area lens. … WebPHYSICAL ELECTRONICS / PHI Model: PHI 5500 / PHI 5600 Category: X-RAY Vintage: 1991 Equipment Details: X-Ray photoelectron spectroscopy (XPS) system Electron spectroscopy for chemical analysis (ESCA) Includes: Ion gun / Sputter etching Omni focus lens / Small spot X-Ray monochromator with Al K alpha E-Flat gun / Neutralizer chicago style website format